Blank Cover Image

Reactive Ion Etching of TiN, TiAlN, CrN and TiCN Films in CF4/O2 and CHF3/O2 Plasmas

Author(s):
Publication title:
Surface engineering for manufacturing applications : symposium held November 28-December 1, 2005, Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
890
Pub. Year:
2006
Page(from):
171
Page(to):
176
Pages:
6
Pub. info.:
Warrendale, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558998445 [1558998446]
Language:
English
Call no.:
M23500/890
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Reactive Ion Etching Of CVD Diamond In CF4/O2, O2 and O2/Ar Plasmas

Leech, Patrick W., Reeves, Geoffrey K., Holland, Anthony S.

Materials Research Society
7 Conference Proceedings ION BEAM ETCHING SYSTEM FOR MERCURY CADMIUM TELLURIDE AND III-V COMPOUND SEMICONDUCTORS

Reeves, Geoffrey k., Leech, Patrick W., Bond, Patrick

Materials Research Society
2 Conference Proceedings Patterning and Reactive Ion Etching of Diamond Films Using Light Coupling Masks

Leech, Patrick W., Reeves, Geoff K., Holland, Anthony S.

Materials Research Society
8 Conference Proceedings ANISOTROPIC AND SELECTIVE REACTIVE ION ETCHING OF SiC IN CHF3 AND OXYGEN PLASMA

Pan, W-S., Steckl, A.J.

Materials Research Society
3 Conference Proceedings Ion Beam Etching of CVD Diamond Enhanced by Prior Au and O Implantation

Leech, Patrick W., Reeves, Geoffrey K., Holland, Anthony S., Ridgway, Mark C.

Materials Research Society
9 Conference Proceedings Planarization of Patterned Aluminum/Diamond Surfaces for SAW Devices

Holland, Anthony S., Reeves, Geoffrey K., Leech, Patrick W.

Materials Research Society
4 Conference Proceedings Reactive ion etching of quartz and glasses for microfabrication

Leech,P.W., Reeves,G.K.

SPIE - The International Society for Optical Engineering
10 Conference Proceedings EFFECTS OF POST ETCH TREATMENTS ON CONTAMINATED SILICON SURFACE DUE TO CHF3/C2F6 REACTIVE ION ETCHING

Park, H.-H., Kwon, K.-H., Lee, S.-H., Nahm, S., Lee, J.-W., Koak, B.-H., Suh, K.-S., Kwon, O.-J., Lee, J.-L., Yeom, …

MRS - Materials Research Society
5 Conference Proceedings Reactive Ion Etching Process of 4H-SiC Using the CHF3/O2 Mixtures and a Post-O2 Plasma-Etching Process

Kang, S. C., Shin, M.W.

Trans Tech Publications
11 Conference Proceedings Kelvin Test Structure Modelling of Metal-Silicide-Silicon Contacts

Reeves, G. K., Holland, A. S., Leech, P. W.

MRS - Materials Research Society
6 Conference Proceedings Reactive Ion Etching Process of 4H-SiC Using the CHF3/O2 Mixtures and a Post-O2 Plasma-Etching Process

Kang, S.C., Shin, M.W.

Trans Tech Publications
12 Conference Proceedings Modeling the Influence of the Silicon Doping Profile on a Silicide Well Ohmic Contact

Reeves, G. K., Holland, A. S., Leech, P. W.

MRS - Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12