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THE DEPOSITION OF SILICON OXIDE FILMS BY LPCVD AT TEMPERATURES AS LOW AS 100°C FROM A NEW LIQUID SOURCE

Author(s):
Publication title:
Chemical perspectives of microelectric materials III : symposium held November 30-December 3, 1992, Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
282
Pub. Year:
1993
Page(from):
569
Page(to):
574
Pages:
6
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558991774 [1558991778]
Language:
English
Call no.:
M23500/282
Type:
Conference Proceedings

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