REDUCTION OF SIDEWALL ROUGHNESS DURING DRY ETCHING OF SiO2
- Author(s):
- Publication title:
- Chemical perspectives of microelectric materials III : symposium held November 30-December 3, 1992, Boston, Massachusetts, U.S.A.
- Title of ser.:
- Materials Research Society symposium proceedings
- Ser. no.:
- 282
- Pub. Year:
- 1993
- Page(from):
- 529
- Page(to):
- 536
- Pages:
- 8
- Pub. info.:
- Pittsburgh, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558991774 [1558991778]
- Language:
- English
- Call no.:
- M23500/282
- Type:
- Conference Proceedings
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