HOW CVD Si/Ge LAYER GROWTH IS CONTROLLED BY EACH ONE OF THE REACTION GAS COMPONENTS
- Author(s):
- Publication title:
- Evolution of surface and thin film microstructure : symposium held November 30-December 4, 1992, Boston, Massachusetts, U.S.A.
- Title of ser.:
- Materials Research Society symposium proceedings
- Ser. no.:
- 280
- Pub. Year:
- 1993
- Page(from):
- 183
- Page(to):
- 188
- Pages:
- 6
- Pub. info.:
- Pittsburgh, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558991750 [1558991751]
- Language:
- English
- Call no.:
- M23500/280
- Type:
- Conference Proceedings
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