MASS SPECTROMETRIC STUDY OF ECR MICROWAVE PLASMA ETCHING OF Si3N4 FILMS

MASS SPECTROMETRIC STUDY OF ECR MICROWAVE PLASMA ETCHING OF Si3N4 FILMS

Author(s):

Publication title:

Materials modification by energetic atoms and ions : symposium held April 28-30, 1992, San Francisco, California, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

268

Pub. Year:

1992

Page(from):

11

Page(to):

16

Pages:

6

Pub. info.:

Pittsburgh, PA: Materials Research Society

ISSN:

02729172

ISBN:

9781558991637 [1558991638]

Language:

English

Call no.:

M23500/268

Type:

Conference Proceedings

Details

TDL ID:	ZA00015752
Series ID:	PA00000011
Conf. info. (Name):	Symposium on materials modification by energetic atoms and ions
Conf. info. (Number):	1992
Conf. info. (Venue):	San Francisco, CA, USA
Conf. info. (Date):	1992.04.28-1992.04.30

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