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THE INFLUENCE OF SUBSTRATE DOPING ON SILICIDE FORMATION WITH TUNGSTEN DEPOSITED FROM TUNGSTEN HEXAFLUORIDE

Author(s):
Zhang, S.-L
Ostling M,
Buchta, R.
Smith, U.
Linnros, J.
Gong, S.-F.
1 more
Publication title:
Advanced metallization and processing for semiconductor devices and circuits--II : symposium held April 27-May 1, 1992, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
260
Pub. Year:
1992
Page(from):
411
Page(to):
416
Pages:
6
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558991552 [1558991557]
Language:
English
Call no.:
M23500/260
Type:
Conference Proceedings

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