SURFACE ELECTRONIC STATES OF LOW TEMPERATURE H-PLASMA CLEANED Si(100) AND Ge(100) SURFACES

SURFACE ELECTRONIC STATES OF LOW TEMPERATURE H-PLASMA CLEANED Si(100) AND Ge(100) SURFACES

Author(s):

Publication title:

Chemical surface preparation, passivation, and cleaning for semiconductor growth and processing : symposium held April 27-29, 1992, San Francisco, California, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

259

Pub. Year:

1992

Page(from):

237

Page(to):

242

Pages:

6

Pub. info.:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558991545 [1558991549]

Language:

English

Call no.:

M23500/259

Type:

Conference Proceedings

Details

TDL ID:	ZA00015743
Series ID:	PA00000011
Conf. info. (Name):	Symposium on chemical surface preparation, passivation, and cleaning for semiconductor growth and processing
Conf. info. (Number):	1992
Conf. info. (Venue):	San Francisco, CA, USA
Conf. info. (Date):	1992.04.27-1992.04.29

Similar Items:

1 Conference Proceedings LOW TEMPERATURE HYDROGEN PLASMA CLEANING PROCESSES OF Si(100), Ge(100), AND SixGe1-x(100) Schneider, T.P., Aldrich, D.A., Cho, J., Nemanich, R.J. Materials Research Society	7 Conference Proceedings HYDROGEN PLASMA CLEANING PRIOR TO LOW TEMPERATURE GATE OXIDE DEPOSITION IN CLUSTER FABRICATED MOSFETs Montgomery, J.S., Barnak, J.P., Bayoumi, A., Hauser, J.R., Nemanich, R.J. Electrochemical Society
2 Conference Proceedings PLASMA-SURFACE INTERACTION LIMITS FOR REMOTE H-PLASMA CLEANING OF Si(100) Schneider, T.P., Bernhard, B.L., Chen, Y.L., Nemanich, R.J. Materials Research Society	8 Conference Proceedings A STUDY OF SURFACE AND SUBSURFACE PROPERTIES OF Si(100) AFTER HYDROGEN ION-BEAM EXPOSURE Liu, H. X., Schneider, T. P., Montgomery, J., Chen, Y. L., Buczkowski, A., Shimura, F., Nemanich, R. J., Maher, D. M., … MRS - Materials Research Society
3 Conference Proceedings PROCESS AND SURFACE CHARACTERIZATION OF HYDROGEN PLASMA CLEANING OF Si(100) Schneider, T.P., Cho, J., Vander Weide, J., Wells, S.E., Lucovsky, G, Nemanich, R.J., Mantini, M.J., Rudder, R.A., … Materials Research Society	9 Conference Proceedings Mechanism of Surface Roughness in Hydrogen Plasma Cleaned <100> Silicon at Low Temperatures Hwang, K-H., Yoon, E., Whang, K-W., Lee, J.Y. Electrochemical Society
4 Conference Proceedings REDUCTION OF SURFACE ROUGHENING AND SUBSURFACE DEFECTS IN H-PLASMA CLEANING OF Si (100) Schneider, T.P., Montgomery, J.S., Ying, H., Barnak, J.P., Chen, Y.L., Maher, D.M., Nemanich, R.J. Electrochemical Society	10 Conference Proceedings LOW TEMPERATURE IN SITU CLEANING OF Si(100) SURFACES AND TRANSMISSION ELECTRON MICROSCOPY OF SUBSEQUENT GROWTH OF EPITAXIAL GERMANIUM Rudder, R.A., Hattangady, S.V., Posthill, J.B., Markunas, R.J. Materials Research Society
5 Conference Proceedings PLASMA SURFACE INTERACTIONS AND SURFACE PRORERTIES FOR REMOTE H-PLASMA CLEANING OF Si(100) Schneider, T. P., Cho, J., Chen, Y. L., Maher, D. M., Nemanich, R. J. MRS - Materials Research Society	11 Conference Proceedings Correlation of Roughness and Device Properties for Hydrogen Plasma Cleaning of Si(100) Prior to Gate Oxidation Montgomery, J. S., Barnak, J. P., Silvestre, C., Hauser, J. R., Nemanich, R. J. MRS - Materials Research Society
6 Conference Proceedings Si(100) SURFACE PREPARATION BY IN-SITU OR IN-VACUO EXPOSURE TO REMOTELY PLASMA-GENERATED ATOMIC HYDROGEN: APPLICATIONS TO DEPOSITED SiO2 AND EPITAXIAL GROWTH OF … Yasuda, T., Ma, Y., Habermehl, S., Kim, S.S., Lucovsky, G., Schneider, T.P., Cho, J., Nemanich R.J. Materials Research Society	12 Conference Proceedings Removal of Fluorine from a Si(100) Surface by a Remote rf hydrogen Plasma Barnak, J. P., King, S., Montgomery, J., Ku, Ja-Hum, Nemanich, R. J. MRS - Materials Research Society

1

2

3

4

5

6

7

8

9

10

11

12