Blank Cover Image

CRYSTAL ORIGINATED SINGULARITIES ON SILICON WAFERS AFTER SCl CLEANING

Author(s):
Publication title:
Chemical surface preparation, passivation, and cleaning for semiconductor growth and processing : symposium held April 27-29, 1992, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
259
Pub. Year:
1992
Page(from):
161
Page(to):
166
Pages:
6
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558991545 [1558991549]
Language:
English
Call no.:
M23500/259
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings INTERACTION OF METALLIC IMPURITIES ADSORBED ON Si WAFERS IN SCl SOLUTION

Okuda, Hitoshi, Ryuta, Jiro, Morita, Eturo, Shimanuki, Yasushi

Materials Research Society
7 Conference Proceedings The Dielectric Breakdown Characteristics of MOS Capacitor of Cz-Si Wafer

Furukawa, J., Shiota, T., Kida, M., Shingyouji, T., Shimanuki, Y.

Electrochemical Society
2 Conference Proceedings The Effect of COP on the Dielectric Breakdown Characteristics of Silicon MOS Capacitor

Shiota, T., Morita, E., Furukawa, J., Furuya, H., Shingyouji, T., Shimanuki, Y.

Electrochemical Society
8 Conference Proceedings The Dielectric Breakdown Characteristics of MOS Capacitor of Cz-Si Wafer

Furukawa,J., Shiota,T., Kida,M., Shingyouji,T., Shimanuki,Y.

SPIE-The International Society for Optical Engineering
3 Conference Proceedings Dependence of the Gate Oxide Integrity on the Crystal Originated Defects in Czochralski Silicon Wafers

Ravi, J., Wijaranakula, W.

Electrochemical Society
9 Conference Proceedings Adsorption and Desorption of Contaminant Metals on Si Wafer Surface in SC1 Solution

Maeda, G., Takahashi, I., Kondo, H., Ryuta, J., Shingyouji, T.

MRS - Materials Research Society
4 Conference Proceedings Megasonic Irradiation-Induced Chemical Reaction in the Solution for Silicon Wafer Cleaning

Ohmi, T., Toda, M., Katoh, M., Kawada, K., Morita, H.

MRS - Materials Research Society
10 Conference Proceedings REFLECTANCE ANISOTROPY AND SPECTROSCOPIC ELLIPSOMETRY CHARACTERISATION OF WET SILICON WAFER CLEANING

Beechinor, J. T., Kelly, P. V., Crean, G. M.

MRS - Materials Research Society
5 Conference Proceedings Characterization of the direct Bonding of Silicon Wafers after Treatment in Dilute HF Solutions

Okada, C., Kawai, Y., Morita, E., Saitou, Y.

Electrochemical Society
11 Conference Proceedings Laser cleaning of silicon wafers: mechanisms and efficiencies

Mosbacher,M., Bertsch,M., Munzer,H.-J., Dobler,V., Runge,B.-U., Bauerle,D., Boneberg,J., Leiderer,P.

SPIE-The International Society for Optical Engineering
6 Conference Proceedings Development of a Modified Silicon Wafer Clean to Improve Lifetime

Hackenberg, D.L., Butler, B.J., Cameron, R.C., Linn, J.H., Lobmeyer, R.N., McNamara, J.M., Pasqua, R.V., Rafie, S., …

Electrochemical Society
12 Conference Proceedings Clean and Conductive Wafer Bonding for MEMS

C. Yun, J. Martin, L. Chen, T.J. Frey

Electrochemical Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12