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INTERPRETATION OF STRETCHED-EXPONENTIAL DEFECT KINETICS IN a-Si:H

Author(s):
Redfield, D.  
Publication title:
Amorphous silicon technology, 1992
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
258
Pub. Year:
1992
Page(from):
341
Page(to):
346
Pages:
6
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558991538 [1558991530]
Language:
English
Call no.:
M23500/258
Type:
Conference Proceedings

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