PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION OF ZrF4-BASED FLUORIDE GLASS FILM AND OXYGEN DOPING EFFECTS ON GLASS FORMING ABILITY

PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION OF ZrF4-BASED FLUORIDE GLASS FILM AND OXYGEN DOPING EFFECTS ON GLASS FORMING ABILITY

Author(s):

Publication title:

Optical waveguide materials : symposium held December 2-4, 1991, Boston, Massachusette, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

244

Pub. Year:

1992

Page(from):

121

Page(to):

126

Pages:

6

Pub. info.:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558991385 [1558991387]

Language:

English

Call no.:

M23500/244

Type:

Conference Proceedings

Details

TDL ID:	ZA00015728
Series ID:	PA00000011
Conf. info. (Name):	Symposium on optical waveguide materials
Conf. info. (Number):	1991
Conf. info. (Venue):	Boston, MA, USA
Conf. info. (Date):	1991.12.02-1991.12.04

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