Blank Cover Image

*A COMPARISON BETWEEN DRY ETCHING WITH AN ELECTRON CYCLOTRON RESONANCE SOURCE AND REACTIVE ION ETCHING FOR GaAs AND InP

Author(s):
Pang, S. W.  
Publication title:
Advanced III-V compound semiconductor growth, processing and devices : symposium held Decmber[i.e. December] 2-5, 1991, Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
240
Pub. Year:
1992
Page(from):
273
Page(to):
284
Pages:
12
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558991347 [1558991344]
Language:
English
Call no.:
M23500/240
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Damage Investigation of GaAs and InGaP Dry Etched with an Electron Cyclotron Resonance Source

Cole, M.W., Han, W.Y., Pfeffer, R.L., Eckart, D.W., Pang, S.W., Ko, K.K., Ren, F., Hobson, W.S., Lothian, J.R., Lopata, …

Electrochemical Society
7 Conference Proceedings RELATING PHOTORESIST ETCH CHARACTERISTICS TO LANGMUIR PROBE MEASUREMENTS IN AN ELECTRON CYCLOTRON RESONANCE SOURCE

Sung, K. T., Juan, W. H., Pang, S. W., Dahimene, M.

MRS - Materials Research Society
2 Conference Proceedings Electrical Characterization and Surface Analysis of Dry Etch Induced Damage on Si after Etching in an Electron Cyclotron Resonance Source

Sung, K. T., Pang, S. W., Cole, M.W., Pearce, N.

Electrochemical Society
8 Conference Proceedings LOW TEMPERATURE SILICON OXIDATION WITH ELECTRON CYCLOTRON RESONANCE OXYGEN PLASMA

Sung, K. T., Pang, S. W.

Materials Research Society
3 Conference Proceedings Surface Damage on GaAs Etched Using a Multipolar Electron Cyclotron Resonance Source

Ko, K.K., Pang, S.W.

Electrochemical Society
9 Conference Proceedings LOW TEMPERATURE SILICON OXIDATION WITH ELECTRON CYCLOTRON RESONANCE OXYGEN PLASMA

Sung, K. T., Pang, S. W.

Materials Research Society
4 Conference Proceedings In-Situ Fiberoptic Thermometry Measurements of Wafer Temperature During Plasma Etching Using an Electron Cyclotron Resonance Source

Thomas, S., III, Berg, E. W., Pang, S. W.

MRS - Materials Research Society
10 Conference Proceedings Ellipsometric Monitoring of Defects Induced by Electron Cyclotron Resonance Etching of GaAs

Snyder, P. G., Ianno, N. J., Wigert, B., Pittal, S., Johs, B., Woollam, J. A.

MRS - Materials Research Society
5 Conference Proceedings Low Temperature Etching of Silylated Resist in an Oxygen Plasma Generated by an Electron Cyclotron Resonance Source

Sung, K.T., Juan, W.H., Pang, S.W.

Electrochemical Society
11 Conference Proceedings THE MECHANISMS OF REACTIVE ION ETCHING OF SiOx (x-2) WITH ELECTRON CYCLOTRON RESONANCE AND KAUFMAN ION

Kant, R. A., Eddy Jr., C. R., Sartwell, B. D.

Materials Research Society
6 Conference Proceedings IN-SITU MONITORING BY MASS SPECTROMETRY FOR GaAs ETCHED WITH AN ELEFCTRON CYCLOTRON RESONANCE SOURCE

Kahaian, D. J., Pang, S. W.

MRS - Materials Research Society
12 Conference Proceedings PLASMA ETCHING OF InP AND RELATED MATERIALS IN ELECTRON CYCLOTRON RESONANCE CH4/H2/Ar DISCHARGES

Pearton, S. J., Chakrabarti, U. K., Kinsell, A. P., Emerson, A. B., Johnson., D., Constantine, C.

Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12