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STRAIN DEPENDENT DIFFUSION IN THE DRY THERMAL OXIDATION PROCESS OF CRYSTALLINE Si

Author(s):
Publication title:
Thin films : stresses and mechanical properties III : symposium held December 2-5, 1991, Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
239
Pub. Year:
1992
Page(from):
81
Page(to):
86
Pages:
6
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558991330 [1558991336]
Language:
English
Call no.:
M23500/239
Type:
Conference Proceedings

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