Blank Cover Image

GROWTH AND HIGH RESOLUTION TEM CHARACTERIZATION OF Ge Si1-x/Si HETERO-STRUCTURES BY REMOTE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION

Author(s):
Qian, R.
Chung, I.
Kinosky, D.
Hsu, T.
Irby, J.
Mahajan, A.
Thomas, S.
Banerjee, S.
Tasch, A.
Rabenberg, L.
Grove, C.
Magee, C.
7 more
Publication title:
Photons and low energy particles in surface processing : symposium held Decmber[i.e. December] 3-6, 1991, Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
236
Pub. Year:
1992
Page(from):
353
Page(to):
360
Pages:
8
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558991309 [1558991301]
Language:
English
Call no.:
M23500/236
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings GROWTH AND HIGH RESOLUTION TEM CHARACTERIZATION OF GexSi1-x/Si HETERO-STRUCTURES BY REMOTE PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION

Qian, R., Chung, I., Kinosky, D., Hsu, T., Irby, J., Mahajan, A., Thomas, S., Banerjee, S., Tasch, A., Rabenberg, L., …

Materials Research Society
7 Conference Proceedings *IN SITU LOW TEMPERATURE CLEANING AND PASSIVATION OF SILICON BY REMOTE HYDROGEN PLASMA FOR SILICON-BASED EPITAXY

Banerjee, S., Tasch, A., Hsu, T., Qian, R., Kinosky, D., Irby, J., Mahajan, A., Thomas, S.

Materials Research Society
2 Conference Proceedings THE DEPENDENCE OF DEFECT DENSITY IN GeXSi1-X/Si HETEROSTRUCTURES GROWN BY REMOTE PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION ON DEPOSITION PARAMETERS

Kinosky, D., Qian, R., Hsu, T., Irby, J., Mahajan, A., Thomas, S., Banerjee, S., Tasch, A., Magee, C., Grove, C. L.

Materials Research Society
8 Conference Proceedings REMOTE PLASMA CLEANING AND ION-INDUCED HYDROGEN DESORPTION FROM THE SILICON (100) SURFACE AND ITS APPLICATIONS TO Si EPITAXY

Kinosky, David S., Qian, R., Mahajan, A., Thomas, S., Fretwell, J., Munguia, P., Banerjee, S., Tasch, A.

Materials Research Society
3 Conference Proceedings HETEROEPITAXY OF Si/Si1-xGex GROWN BY REMOTE PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION

Hsu, T., Qian, R., Kinosky, D., Irby, J., Anthony, B., Banerjee, S., Tasch, A., Magee, C.

Materials Research Society
9 Conference Proceedings *REACTION KINETICS OF EPITAXIAL SILICON DEPOSITION AT 200-400o USING REMOTE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION

Anthony, B., Hsu, T., Breaux, L., Banerjee, S., Tasch, A.

Materials Research Society
4 Conference Proceedings CHARACTERIZATION OF IN SITU P-TYPE ANDN-TYPE DOPED Si AND GeXSi1-X FILMS GROWN BY LOW TEMPERATURE REMOTE PLASMA CHEMICAL VAPOR DEPOSITION

Thomas, S., Irby, J., Kinosky, D., Qian, R., Iqbal, I., Mahajan, A., Benerjee, S., Tasch, A, Magee, C.

Materials Research Society
10 Conference Proceedings REMOTE PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION OF EPITAXIAL SILICON ON SILICON (100) AT 150oC

Hsu, T., Anthony, B., Breaux, L., Banerjee, S., Tasch, A.

Materials Research Society
5 Conference Proceedings GROWTH OF Ge-ON-Si STRUCTURES USING REMOTE PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION

Qian, Rong Z., Kinosky, D., Mahajan, A., Thomas, S., Fretwell, J., Munguia, P., Banerjee, S., Tasch, A.

Materials Research Society
11 Conference Proceedings HYDROGEN PLASMA CLEANING OF THE Si(100) SURFACE: REMOVAL OF OXYGEN AND CARBON AND THE ETCHING OF Si

Kinosky, David, Qian, R., Mahajan, A., Thomas, S., Munguia, P., Fretwell, J., Banerjee, S., Tasch, A.

MRS - Materials Research Society
6 Conference Proceedings HF/ALCOHOL PREPARATION OF WAFERS FOR THE REDUCTION OF HAZE IN LOW TEMPERATURE Si EPITAXY BY REMOTE PLASMA CHEMICAL VAPOR DEPOSITION

Kinosky, D., Qian, R., Mahajan, A., Thomas, S., Munguia, P., Fretwell, J., Banerjee, S., Tasch, A., Magee, C.

MRS - Materials Research Society
12 Conference Proceedings THE USE OF LANGMUIR PROBE MEASUREMENTS TO STUDY REACTION KINETICS IN REMOTE PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION OF SILICON

Anthony, B., Hsu, T., Breaux, L., Qian, R., Baner-jee, S., Tasch, A.

Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12