Si-N BONDING AT THE SiO2/Si INTERFACES DURING DEPOSITION OF SiO2 BY THE REMOTE PECVD PROCESS

Si-N BONDING AT THE SiO2/Si INTERFACES DURING DEPOSITION OF SiO2 BY THE REMOTE PECVD PROCESS

Author(s):

Publication title:

Photons and low energy particles in surface processing : symposium held Decmber[i.e. December] 3-6, 1991, Boston, Massachusetts, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

236

Pub. Year:

1992

Page(from):

341

Page(to):

348

Pages:

8

Pub. info.:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558991309 [1558991301]

Language:

English

Call no.:

M23500/236

Type:

Conference Proceedings

Details

TDL ID:	ZA00015720
Series ID:	PA00000011
Conf. info. (Name):	Symposium on photons and low energy particles in surface processing
Conf. info. (Number):	1991
Conf. info. (Venue):	Boston, MA, USA
Conf. info. (Date):	1991.12.03-1991.12.06

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