STRUCTURAL AND INTERFACIAL CHARACTERISTICS OF THIN (<10 nm) Si02 FILMS GROWN BY ELECTRON CYCLOTRON RESONANCE PLASMA OXIDATION ON [100] Si SUBSTRATES

STRUCTURAL AND INTERFACIAL CHARACTERISTICS OF THIN (<10 nm) Si02 FILMS GROWN BY ELECTRON CYCLOTRON RESONANCE PLASMA OXIDATION ON [100] Si SUBSTRATES

Author(s):

Publication title:

Low energy ion beam and plasma modification of materials : symposium held April 30-May 2, 1991, Anaheim, California, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

223

Pub. Year:

1991

Page(from):

75

Page(to):

80

Pages:

6

Pub. info.:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558991170 [1558991174]

Language:

English

Call no.:

M23500/223

Type:

Conference Proceedings

Details

TDL ID:	ZA00015707
Series ID:	PA00000011
Conf. info. (Name):	Symposium on low energy ion beam and plasma modification of materials
Conf. info. (Number):	1991
Conf. info. (Venue):	Anaheim, CA, USA
Conf. info. (Date):	1991.04.30-1991.05.02

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