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ION/NEUTRAL BEAM ASSISTED ETCHING OF SEMICONDUCTORS: CHEMICAL MODIFICATIONS OF THE ADSORBED PHASE

Author(s):
Publication title:
Low energy ion beam and plasma modification of materials : symposium held April 30-May 2, 1991, Anaheim, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
223
Pub. Year:
1991
Page(from):
61
Page(to):
68
Pages:
8
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558991170 [1558991174]
Language:
English
Call no.:
M23500/223
Type:
Conference Proceedings

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