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GROWTH OF Si1-xGex STRAINED LAYERS USING ATMOSPHERIC-PRESSURE CVD

Author(s):
Namavar, F.
Manke, J.M.
Kvam, E.P.
Sanfacon, M.M.
Perry, C.H.
Kalkhoran, N.M.
1 more
Publication title:
Silicon molecular beam epitaxy : symposium held April 29-May 3, 1991, Anaheim, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
220
Pub. Year:
1991
Page(from):
285
Page(to):
290
Pages:
6
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558991149 [155899114X]
Language:
English
Call no.:
M23500/220
Type:
Conference Proceedings

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