Blank Cover Image

KINETICS OF GAS-PHASE CHEMICAL REACTIONS AND GROWTH OF a-SiC:H FILMS FROM SILANE AND ACETYLENE IN A REMOTE HYDROGEN PLASMA REACTOR

Author(s):
Publication title:
Amorphous silicon technology 1991 : symposium held April 30-May 3, 1991, Anaheim, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
219
Pub. Year:
1991
Page(from):
703
Page(to):
708
Pages:
6
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558991132 [1558991131]
Language:
English
Call no.:
M23500/219
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings MEASUREMENT OF INTRINSIC STRESS IN a-Si:H THIN FILMS DEPOSITED IN A REMOTE HYDROGEN PLASMA REACTOR

Stevens, K.S., Johnson, N.M.

Materials Research Society
7 Conference Proceedings Growth Kinetics of Chemically Vapor Deposited Silica Films from Silane/Oxygen Mixtures

Ojeda, F., Castro-Garcia, A., Gomez-Aleixandre, C., Albella, J.M.

Electrochemical Society
2 Conference Proceedings DEPOSITION OF a-Si:H FILMS WITH A REMOTE HYDROGEN PLASMA

Johnson, N. M,., Walker, J., Doland, C. M., Winer, K., Street, R. A.

Materials Research Society
8 Conference Proceedings HETERO-EPITAXIAL GROWTH OF SiC FILMS BY CVD FROM SILANE METHANE, PROPANE, AND HYDROGEN MIXTURES

Bahavar, B., Chaudhry, M.I., McCluskey, R.J.

Materials Research Society
3 Conference Proceedings Hydrogen Assisted Remote Plasma Enhanced Chemical Vapor Deposition of Amorphous Silicon Nitride Films

Santos-Filho, P., Koh, K., Stevens, G., Lucovsky, G.

MRS - Materials Research Society
9 Conference Proceedings ELECTRON TRANSPORT AND CONDUCTION-BAND-TAIL STATES IN a-Si:H DEPOSITED WITH A REMOTE HYDROGEN PLASMA

Nebel, C.E., Street, R.A., Johnson, N.M., Walker, J.

Materials Research Society
4 Conference Proceedings Bonding of Hydrogen and Deuterium in Silicon Nitride Films Prepared by Remote Plasma Enhanced Chemical Vapor Deposition

Stevens, G., Santos-Filho, P., Habermehl, S., Lucovsky, G.

MRS - Materials Research Society
10 Conference Proceedings Computational Modeling of Homogeneous Nucleation and Particle Growth During Chemical Vapor Deposition of Silicon Films from Silane Plasmas

Warthesen, S, Bhandarkar, U, Girshick, S, Kortshagen, U

Materials Research Society
5 Conference Proceedings HYDROGEN BONDING IN a-Si:H PREPARED BY REMOTE HYDROGEN PLASMA DEPOSITION

Ready, S. E., Boyce, J. B., Johnson, N. M., Walker, J., Steveas, K. S.

Materials Research Society
11 Conference Proceedings Temperature-Dependent Studies of a-SiC:H Growth by Remote Plasma CVD Using Methylsilanes

Lee, Moon-Sook, Lal, Pratik, Bent, Stacey F.

MRS - Materials Research Society
6 Conference Proceedings ENHANCED HYDROGEN DIFFUSION UNDER ILLUMINATION IN HYDROGENATED AMORPHOUS SILICON

Santos, P.V., Johnson, N.M., Street, R.A.

Materials Research Society
12 Conference Proceedings PLASMA ETCHING AND SURFACE ANALYSIS OF a-SiC:H FILMS DEPOSITED BY LOW TEMPERATURE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION

Thomas, J. H., III, Loboda, M. J., Seifferly, J. A.

MRS - Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12