STUDY OF DIFFUSION BARRIERS FOR PZT DEPOSITED ON Si FOR NON-VOLATILE RANDOM-ACCESS MEMORY TECHNOLOGY

STUDY OF DIFFUSION BARRIERS FOR PZT DEPOSITED ON Si FOR NON-VOLATILE RANDOM-ACCESS MEMORY TECHNOLOGY

Author(s):

Publication title:

Ferroelectric thin films : symposium held April 16-20, 1990, San Francisco, California, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

200

Pub. Year:

1990

Page(from):

193

Page(to):

198

Pages:

6

Pub. info.:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558990890 [1558990895]

Language:

English

Call no.:

M23500/200

Type:

Conference Proceedings

Details

TDL ID:	ZA00015684
Series ID:	PA00000011
Conf. info. (Name):	Symposium on ferroelectric thin films
Conf. info. (Number):	1990
Conf. info. (Venue):	San Francisco, CA, USA
Conf. info. (Date):	1990.04.16-1990.04.20

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