ETCHING SELECTIVITY OF SiF4 AND H2 PLASMAS FOR c-Si, A-Si:H AND Si02
- Author(s):
- Publication title:
- Amorphous silicon technology, 1990 : symposium held April 17-20, 1990, San Francisco, California, U.S.A.
- Title of ser.:
- Materials Research Society symposium proceedings
- Ser. no.:
- 192
- Pub. Year:
- 1990
- Page(from):
- 541
- Page(to):
- 546
- Pages:
- 6
- Pub. info.:
- Pittsburgh, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558990814 [155899081X]
- Language:
- English
- Call no.:
- M23500/192
- Type:
- Conference Proceedings
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