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THE USE OF LANGMUIR PROBE MEASUREMENTS TO STUDY REACTION KINETICS IN REMOTE PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION OF SILICON

Author(s):
Anthony, B.
Hsu, T.
Breaux, L.
Qian, R.
Baner-jee, S.
Tasch, A.
1 more
Publication title:
Plasma processing and synthesis of materials III : symposium held April 17-19, 1990, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
190
Pub. Year:
1991
Page(from):
267
Page(to):
272
Pages:
6
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558990791 [1558990798]
Language:
English
Call no.:
M23500/190
Type:
Conference Proceedings

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