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IN SITU STRESS MEASUREMENTS DURING THE FORMATION OF TiSi2 C49 ON Si WAFERS

Author(s):
Publication title:
Thin films : stresses and mechanical properties II : symposium held April 16-19, 1990, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
188
Pub. Year:
1990
Page(from):
61
Page(to):
66
Pages:
6
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558990777 [1558990771]
Language:
English
Call no.:
M23500/188
Type:
Conference Proceedings

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