CHARACTERIZATION OF MOCVD GROWN EPITAXIAL CERAMIC OXIDE THIN FILMS

CHARACTERIZATION OF MOCVD GROWN EPITAXIAL CERAMIC OXIDE THIN FILMS

Author(s):

Publication title:

Chemical vapor deposition of refractory metals and ceramics : symposium held November 29-December 1, 1989, Boston, Massachusetts, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

168

Pub. Year:

1990

Page(from):

337

Page(to):

342

Pages:

6

Pub. info.:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558990562 [1558990569]

Language:

English

Call no.:

M23500/168

Type:

Conference Proceedings

Details

TDL ID:	ZA00015652
Series ID:	PA00000011
Conf. info. (Name):	Symposium on chemical vapor deposition of refractory metals and ceramics
Conf. info. (Number):	1989
Conf. info. (Venue):	Boston, MA, USA
Conf. info. (Date):	1989.11.29-1989.12.01

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