INTERNAL STRESSES IN AMORPHOUS MOCVD SiO2 FILMS

INTERNAL STRESSES IN AMORPHOUS MOCVD SiO2 FILMS

Author(s):: Desu, Seshu B.
Publication title:: Chemical vapor deposition of refractory metals and ceramics : symposium held November 29-December 1, 1989, Boston, Massachusetts, U.S.A.
Title of ser.:: Materials Research Society symposium proceedings
Ser. no.:: 168
Pub. Year:: 1990
Page(from):: 221
Page(to):: 226
Pages:: 6
Pub. info.:: Pittsburgh, Pa.: Materials Research Society
ISSN:: 02729172
ISBN:: 9781558990562 [1558990569]
Language:: English
Call no.:: M23500/168
Type:: Conference Proceedings

Details

TDL ID:	ZA00015652
Series ID:	PA00000011
Conf. info. (Name):	Symposium on chemical vapor deposition of refractory metals and ceramics
Conf. info. (Number):	1989
Conf. info. (Venue):	Boston, MA, USA
Conf. info. (Date):	1989.11.29-1989.12.01

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