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MECHANISTIC ASPECTS OF THE DEPOSITION OF THIN ALUMINA FILMS DEPOSITED BY MOCVD

Author(s):
Publication title:
Chemical vapor deposition of refractory metals and ceramics : symposium held November 29-December 1, 1989, Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
168
Pub. Year:
1990
Page(from):
125
Page(to):
130
Pages:
6
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558990562 [1558990569]
Language:
English
Call no.:
M23500/168
Type:
Conference Proceedings

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