REACTIVE ION ETCHING OF In-BASED III-V SEMICONDUCTORS COMPARISON OF Cl AND C2H6 CHEMISTRIES
- Author(s):
- Publication title:
- In-situ patterning : selective area deposition and etching : symposium held November 29-December 1, 1989, Boston, Massachusetts, U.S.A.
- Title of ser.:
- Materials Research Society symposium proceedings
- Ser. no.:
- 158
- Pub. Year:
- 1990
- Page(from):
- 417
- Page(to):
- 424
- Pages:
- 8
- Pub. info.:
- Pittsburgh, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558990463 [1558990461]
- Language:
- English
- Call no.:
- M23500/158
- Type:
- Conference Proceedings
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