Blank Cover Image

THE EFFECT OF WATER VAPOR AND OXYGEN IN THE PROCESSING ENVIRONMENT ON THE PROPERTIES OF SPUTTERED a-Si:H FILMS

Author(s):
Publication title:
Amorphous silicon technology, 1989 : symposium held April 25-28, 1989, San Diego, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
149
Pub. Year:
1989
Page(from):
75
Page(to):
80
Pages:
6
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558990227 [1558990224]
Language:
English
Call no.:
M23500/149
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings a-Si:H THIN FILM TRANSISTORS AND LOGIC CIRCUITS FABRICATED IN AN INTEGRATED MULTICHAMBER SYSTEM

Kim, S. S., Wang, C., Parsons, G. N., Lucovsky, G.

Materials Research Society
7 Conference Proceedings FORMATION OF MICROCRYSTALLINE SILICON FILM BY RMS PROCES

Wang, Cheng, Parsons, G.N., Buehler, E.C., Memanich, R.J., Lucovsky, G.

Materials Research Society
2 Conference Proceedings ANNEALING OF IRREVERSIBLE DEFECTS IN HYDROGENATED AND UNHYDROGENATED AMORPHOUS SILISON THIN FILMS

Parsons, G. N., Wang, C., Lucovsky, G.

Materials Research Society
8 Conference Proceedings DEPOSITION OF HEAVILY-DOPED μc-SILICON THIN FILMS BY REMOTE PLASMA-ENHANCED CHEMICAL-VAPOR DEPOSITION PROCESS (remote PECVD)

Wang, C:, Bjorkman, C.H., Lee, D.R., Williams, M.J., Lucovsky, G.

Materials Research Society
3 Conference Proceedings GROWTH OF a-Si:H FILMS BY REMOTE PLASMA ENHANCED CVD (RPECVD)

Parsons, G.N., Tsu, D.V., Lucovsky, G.

Materials Research Society
9 Conference Proceedings μc SILICON THIN FILMS DEPOSITED BY REMOTE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITORS PROCESS

Wang, C, Parsons, G. N., Kim, S. S., Buehler, E. C., Nemanich, R. J., Locuvsky, G.

Materials Research Society
4 Conference Proceedings THE EFFECTS OF SURFACE AND INTERFACE DEPLETION REGIONS ON THE PHOTOCONDUCTIVITY OF a-Si:H IN SURFACE CELL STRUCTURES

Parson, G.N., Kusano, C., Lucovsky, G.

Materials Research Society
10 Conference Proceedings RAMAN SCATTERING FROM MICROCRYSTALLINE FILMS: CONSIDERATIONS OF COMPOSITE STRUCTURES WITH DIFFERENT OPTICAL ABSORPTION PROPERTIES

Nemanich, R.J., Buehler, E.C., LeGrice, Y.M., Shroder, R.E., Parsons, G.N., Wang, C., Lucovsky, G., Boyce, J.B.

Materials Research Society
5 Conference Proceedings POLYHYRIDE BONDING GROUPS IN PECVD AMORPHOUS Si THIN FILMS

Davidson, B.N., Parsons, G.N., Wang, C., Lucovsky, G.

Materials Research Society
11 Conference Proceedings COMPOSITION AND PROPERTIES OF PECVD SILICON NITRIDE FILMS DEPOSITED FROM SiH4, N2, He GASES

Souk, J.H., Parsons, G.N., Batey, J.

Materials Research Society
6 Conference Proceedings ESTIMATION OF DEFECT STATE DENSITIES FROM BULK PHOTOELECTRONIC PROPERTIES OF A-SI,Ge:H ALLOYS

Parsons, G. N., Lucovsky, G.

Materials Research Society
12 Conference Proceedings DEPOSITION OF AMORPHOUS AND MICROCRYSTALLINE Si,C ALLOY THIN FILMS BY A REMOTE PLASMA-ENHANCED CHEMICAL-VAPOR DEPOSITION PROCESS

Wang, C., Lucovsky, G., Nemanich, R.J.

Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12