Blank Cover Image

EFFECT OF RECOIL IMPLANTATION OF OXYGEN ON BORON ENHANCED DIFFUSION IN SILICON

Author(s):
Publication title:
Ion beam processing of advanced electronic materials : symposium held April 25-27, 1989, San Diego, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
147
Pub. Year:
1989
Page(from):
79
Page(to):
84
Pages:
6
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558990203 [1558990208]
Language:
English
Call no.:
M23500/147
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings THE ION IMPLANTED ARSENIC TAIL IN SILICON

Beck, S. E., Jaccordine, R. J., Clark, C.

Materials Research Society
7 Conference Proceedings BORON-ENHANCED-DIFFUSION OF BORON FROM ULTRA- LOW-ENERGY BORON IMPLANTATION

Agarwal, A., Eaglesham, D.J., Gossmann, H.-J., Pelaz, L., Herner, S.B., Jacobson, D.C., Haynes, T.E., Erokhin, Yu E.

Electrochemical Society
2 Conference Proceedings The Effect Of Impurities On Diffusion And Activation Of Ion Implanted Boron In Silicon

Robertson, L.S., Brindos, R., Jones, K. S., Law, Mark E., Downey, D. F., Falk, S., Liu, J.

Materials Research Society
8 Conference Proceedings ANNEALING AND DIFFUSION OF BORON IN SELF-IMPLANTED SILICON BY FURNACE AND ELECTRON BEAM HEATING

Godfrey, D. J., McMahon, R. A., Hasko, D. G., Ahmed, H., Dowsett, M. G.

Materials Research Society
3 Conference Proceedings Implant Enhanced Diffusion of Boron in Silicon Germanium

Fang, Wingra T. C., Griffin, Peter B., Plummer, James D.

MRS - Materials Research Society
9 Conference Proceedings ENHANCED OXYGEN DIFFUSION IN SILICON AT LOW TEMPERATURES.

TIPPING,A.K., NEWMAN,R.C., NEWTON,D.C., TUCKER,J.H.

Trans Tech Publications
4 Conference Proceedings Transient-Enhanced Diffusion of Boron in Silicon: The Interstitial Flux

Simpson, T. W., Goldberg, R. D., Mitchell, I. V., Baribeau, J-M.

MRS - Materials Research Society
10 Conference Proceedings Influence of Flouring and BF2 Implants on the Transient Enhanced Diffusion of Boron

Vuong, H-H., Gossmann, H.-J., Rafferty, C.S., Luftman, H.S., Unterwald, F.C., Jacobson, D.C., Ahrens, R.E, Boone, T., …

Electrochemical Society
5 Conference Proceedings Transient Enhanced Diffusion of Boron in Silicon: The Interstitial Flux

Simpson, T. W., Goldberg, R. D., Mitchell, I. V., Baribeau, J-M.

MRS - Materials Research Society
11 Conference Proceedings DIFFUSION AND ACTIVATION DURING RAPID THERMAL ANNEALING OF IMPLANTED BORON IN SILICON

Cowern, N.E.B., Yallup, K.J., Godfrey, D.J., Hasko, D.G., McMahon, R.A., Ahmed, H., Stobbs, W.M., McPhail, D.S.

Materials Research Society
6 Conference Proceedings Enhanced Boron Diffusion in Amorphous Silicon

Jacques, J.M., Burbure, N., Jones, K.S., Law, M.E., Robertson, L.S., Downey, D.F., Rubin, L.M., Bennett, J., Beebe, M., …

Materials Research Society
12 Conference Proceedings The Influence of Amorphizing Implants on Boron Diffusion in Silicon

Chao, H. S., Griffin, P. B., Plummer, J. D.

MRS - Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12