KINETIC AND X-RAY PHOTOELECTRON SPECTROSCOPIC STUDIES OF THE THERMAL NITRIDATION OF Si(100)

KINETIC AND X-RAY PHOTOELECTRON SPECTROSCOPIC STUDIES OF THE THERMAL NITRIDATION OF Si(100)

Author(s):

Publication title:

Chemical perspectives of microelectronic materials : symposium held November 30-December 2, 1988, Boston, Massachusetts, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

131

Pub. Year:

1989

Page(from):

215

Page(to):

222

Pages:

8

Pub. info.:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558990043 [1558990046]

Language:

English

Call no.:

M23500/131

Type:

Conference Proceedings

Details

TDL ID:	ZA00015616
Series ID:	PA00000011
Conf. info. (Name):	Symposium on chemical perspectives of microelectronic materials
Conf. info. (Number):	1988
Conf. info. (Venue):	Boston, MA, USA
Conf. info. (Date):	1988.11.30-1988.12.02

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