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A COMPARISON OF THE GAS PHASE PROCESSES RESULTING FROM SiH4 AND Si2H6 PHOTODISSOCIATION WITH A PULSED ArF EXCIMER LASER

Author(s):
Publication title:
Laser and particle-beam chemical processes on surfaces : symposium held November 29-December 2, 1988, Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
129
Pub. Year:
1989
Page(from):
195
Page(to):
200
Pages:
6
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558990029 [155899002X]
Language:
English
Call no.:
M23500/129
Type:
Conference Proceedings

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