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FORMATION OF BURIED TiSi2 LAYERS IN SINGLE CRYSTAL SILICON BY ION IMPLANTATION

Author(s):
Publication title:
Silicon-on-insulator and buried metals in semiconductors : symposium held November 30-December 3, 1987, Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
107
Pub. Year:
1988
Page(from):
281
Page(to):
286
Pages:
6
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9780931837753 [0931837758]
Language:
English
Call no.:
M23500/107
Type:
Conference Proceedings

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