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EFFECTS OF SILICON IMPLANTATION AND PROCESSING TEMPERATURE ON PERFORMANCE OF POLYCRYSTALLINE SILICON THIN-FILM TRANSISTORS FABRICATED FROM LOW PRESSURE CHEMICAL VAPOR DEPOSITED AMORPHOUS SILICON

Author(s):
Publication title:
Polysilicon films and interfaces : symposium held December 1-3, 1987, Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
106
Pub. Year:
1988
Page(from):
305
Page(to):
310
Pages:
6
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9780931837746 [093183774X]
Language:
English
Call no.:
M23500/106
Type:
Conference Proceedings

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