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DEGRADATION OF TiSi2/n+-POLYSILICON INTERFACES DUE TO HIGH TEMPERATURE PROCESSING

Author(s):
Shenai, K.
Piacente, P. A.
Smith, G. A.
Lewis, N.
McConnell, M . D.
Norton, J. F.
Hall, E. L.
Baliga, B. J.
3 more
Publication title:
Polysilicon films and interfaces : symposium held December 1-3, 1987, Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
106
Pub. Year:
1988
Page(from):
149
Page(to):
154
Pages:
6
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9780931837746 [093183774X]
Language:
English
Call no.:
M23500/106
Type:
Conference Proceedings

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