Blank Cover Image

*FILM GROWTH MECHANISM OF PHOTO-CHEMICAL VAPOR DEPOSITION

Author(s):
Publication title:
SiO[2] and its interfaces : symposium held November 30-December 5, 1987, Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
105
Pub. Year:
1988
Page(from):
59
Page(to):
70
Pages:
12
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9780931837739 [0931837731]
Language:
English
Call no.:
M23500/105
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings BLUE LIKE DIAMOND LIGHT EMITTING DEVICES TO BE MASS-PRODUCED

Kadono, M., Hayashi, S., Hirose, N., Itoh, K., Inushima, T., Yamazaki, S.

Materials Research Society
7 Conference Proceedings KINETICS OF DIAMOND-LIKE FILM GROWTH USING FILAMENT-ASSISTED CHEMICAL VAPOR DEPOSITION

Gorsuch, G., Jin, Y., Ingle, N. K., Mountziaris, T. J., Yu, W.-Y., Petrou, A.

MRS - Materials Research Society
2 Conference Proceedings Growth of High Quality InGaN Films by Metalorganic Chemical Vapor Deposition

Roberts, J. C., McIntosh, F. G., Boutros, K. S., Bedair, S. M., Moussa, M., Piner, E. L., He, Y., El-Masry, N. A.

MRS - Materials Research Society
8 Conference Proceedings Quality Improvement of SiO2-Films by Adding Foreign Gases in Photo-Chemical Vapor Deposition

Maroyama, Y., Miyano, J.-I., Yokoyama, T, Toshikawa, K., Mori, T., Murata, H., kurosawa, K., yokotani, A., Sasaki, W.

Electrochemical Society
3 Conference Proceedings SiO2 Deposition Mechanism in Photo-Chemical Vapor Deposition Using Vacuum Ultraviolet Excimer Lamp

Miyano, J., Motoyama, Y., Toshikawa, K., Yokoyama, T., Mutou, H., Kurosawa, K., Yokotani, A., Sasaki, W.

Electrochemical Society
9 Conference Proceedings Growth Mechanism of Thin-Film Wide-Gap Semiconductors by Chemical Bath Deposition Technique

Hair, P. K., Nair, M. T. S., Parmana, P.

Materials Research Society
4 Conference Proceedings Effect of growth parameters on refractive index and film composition of plasma enhanced chemical vapor deposition silicon oxynitride films

Naskar, S., Bower, C. A., Yadon, L. N., Wolter, S. D., Stoner, B. R., Glass, J. T.

Materials Research Society
10 Conference Proceedings Fabrication of CeO2 Dielectric Films by Chemical Vapor Deposition with a Liquid Metal Organic Source

K. Ishibashi, S. Setsu, N. Keiichi, T. Kazunari, O. Masatsugu, S. Kiyotaka, Y. Yasuhiro

Electrochemical Society
5 Conference Proceedings Singularity in growth of Pt and Ir films obtained by metalorganic chemical vapor deposition

Nizard, H., Gelfond, N. V., Morozova, N. B., Igumenov, I. K., Fietzek, H., Gimeno-Fabra, L., Redjaimia, A.

Electrochemical Society
11 Conference Proceedings Chemical Vapor Deposition Technology of (Ba,Sr)TiO3 Thin Films for Gbit-Scale Dynamic Random Access Memories

Horikawa, T., Tarutani, M., Kawahara, T., Yamamuka, M., Hirano, N., Sato, T., Matsuno, S., Shibano, T., Uchikawa, F., …

MRS - Materials Research Society
6 Conference Proceedings Selective growth of conjugated polymer thin film with nanoscale controlling by chemical vapor depositions toward ’Nanonics’ [5931-17]

Suzuki, Y., Kazama, H., Terasawa, N., Naito, Y., Yoshimura, T., Arai, Y., Asama, K., Tokyo Univ. of Technology (Japan)

SPIE - The International Society of Optical Engineering
12 Conference Proceedings Self-Assembling Formation of Silicon Quantum Dots by Low Pressure Chemical Vapor Deposition

Nakagawa, K., Fukuda, M., Miyazaki, S., Hirose, M.

MRS - Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12