MASKLESS ETCHING OF SiO2 BY ION BEAM ASSISTED ETCHING TECHNIQUE
- Author(s):
- Publication title:
- Laser and particle-beam chemical processing for microelectronics : symposium held December 1-3, 1987, Boston, Massachusetts, USA
- Title of ser.:
- Materials Research Society symposium proceedings
- Ser. no.:
- 101
- Pub. Year:
- 1988
- Page(from):
- 477
- Page(to):
- 482
- Pages:
- 6
- Pub. info.:
- Pittsburgh, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9780931837692 [0931837693]
- Language:
- English
- Call no.:
- M23500/101
- Type:
- Conference Proceedings
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