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PLASMA CHEMICAL ASPECTS OF MAGNETRON ION ETCHING WITH CF4/O2 AND CF4/H2

Author(s):
Publication title:
Plasma processing and synthesis of materials : symposium held April 21-23, 1987, Anaheim, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
98
Pub. Year:
1987
Page(from):
217
Page(to):
222
Pages:
6
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9780931837654 [0931837650]
Language:
English
Call no.:
M23500/98
Type:
Conference Proceedings

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