APPLICATION OF A LOW FREQUENCY TECHNIQUE TO THE STUDY OF AMORPHOUS MATERIALS

APPLICATION OF A LOW FREQUENCY TECHNIQUE TO THE STUDY OF AMORPHOUS MATERIALS

Author(s):

Publication title:

Amorphous silicon semiconductors -- Pure and hydrogenated : symposium held April 21-24, 1987, Anaheim, California, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

95

Pub. Year:

1987

Page(from):

77

Page(to):

82

Pages:

6

Pub. info.:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9780931837623 [0931837626]

Language:

English

Call no.:

M23500/95

Type:

Conference Proceedings

Details

TDL ID:	ZA00015581
Series ID:	PA00000011
Conf. info. (Name):	Symposium on amorphous silicon semiconductors
Conf. info. (Number):	1987
Conf. info. (Venue):	Anaheim, CA, USA
Conf. info. (Date):	1987.04.21-1987.04.24

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