*FABRICATION OF Si-GATE CMOS DEVICES IN A HETEROEPITAXIAL Si/CaF2/Si STRUCTURE

*FABRICATION OF Si-GATE CMOS DEVICES IN A HETEROEPITAXIAL Si/CaF2/Si STRUCTURE

Author(s):

Publication title:

Heteroepitaxy on silicon II : symposium held April 21-23, 1987, Anaheim, California, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

91

Pub. Year:

1987

Page(from):

349

Page(to):

358

Pages:

10

Pub. info.:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9780931837586 [0931837588]

Language:

English

Call no.:

M23500/91

Type:

Conference Proceedings

Details

TDL ID:	ZA00015577
Series ID:	PA00000011
Conf. info. (Name):	Symposium on heteroepitaxy on silicon
Conf. info. (Number):	2nd
Conf. info. (Venue):	Anaheim, CA, USA
Conf. info. (Date):	1987.04.21-1987.04.23

Similar Items:

1 Conference Proceedings THERMAL STABILITY OF HETEROEPITAXIAL CaF2/Si AND Si/CaF2/Si STRUCTURES Hirashita, N., Sasaki, M., Onoda, H., Hagiwara, S. Materials Research Society	7 Conference Proceedings An in-line image quality monitoring system for imaging device fabrication using automated macro-inspection [6152-113] Sasaki, T., Hikichi, K., Sugimoto, D., Izumi, N., Uda, M, Kohayse, A, Yamashita, H. SPIE - The International Society of Optical Engineering
2 Conference Proceedings REDUCTION OF Ca and F SEGREGATED AT THE SURFACE OF A Si/CaF2/Si(100) STRUCTURE BY SOLID PHASE EPITAXY OF Si Sasaki, M., Onoda, H., Hirashita, N. Materials Research Society	8 Conference Proceedings 26 Tantalum-based Gate Electrode Metals for Advanced CMOS Devices Hooker, J. C., Lander, R.J.P., Cubaynes, F. N., Schram, T., Roozeboom, F., van Zijl, J., Moos, M., van den Heuvel, F.C., … Electrochemical Society
3 Conference Proceedings DOPANT SEGREGATION AT POLYCRYSTALLINE SILICON GRAIN BOUNDARIES IN DEVICE FABRICATION PROCESSES Itoh, M., Aikawa, I., Hirashita, N., Ajioka, T. Materials Research Society	9 Conference Proceedings STUDIES OF THE EFFECT OF RAPID THERMAL ANNEALING ON THE STRUCTURAL AND ELECTRICAL PROPERTIES OF THE HETEROEPITAXIAL CaF2/CoSi2/Si(111) STRUCTURES Phillips, Julia M., Hensel, J.C., Joy, D.C., Augustyniak, W.M. Materials Research Society
4 Conference Proceedings Uniaxially Strained SGOI and SSOI Channels for High Performance Multi-Gate CMOS T. Irisawa, T. Numata, T. Tezuka, K. Usuda, N. Hirashita Electrochemical Society	10 Conference Proceedings Evaluation of immersion lithography processes for 55-nm node logic devices T. Nakata, T. Kodama, M. Komori, N. Onoda, T. Uchiyama SPIE - The International Society of Optical Engineering
5 Conference Proceedings IMPROVING THE QUALITY OF A HETEROEPITAXIAL CaF2 OVERLAYER BY RAPID POST ANNEALING Pfeiffer, L., Phillips, J. M., Smith III, T. P., Augustyniak, W. M., West, K. W. Materials Research Society	11 Conference Proceedings HETEROEPITAXY OF Si, Ge, AND GaAS FILMS ON CaF2/Si STRUCTURES Ishiwara, H., Asano, T., Lee, H.C., Kuriyama, Y., Seki, K., Furukawa, S. Materials Research Society
6 Conference Proceedings Supplementation to DICOM Supplement 32(digital x-ray)for digitized film image and computed radiography Katoh,T., Saitoh,H., Matsumoto,M., Ohbayashi,N., Sasaki,T., Shimanishi,S. SPIE - The International Society for Optical Engineering	12 Conference Proceedings (3.1) 3:20 - 3:50 PM - Strained-Si/SiGe-on-Insulator CMOS Technology as a Platform of Device Performance Boosters (Invited) Takagi, S., Mizuno, T., Tezuka, T, Sugiyama, N., Numata, T., Usuda, K., Moriyama, Y., Nakaharai, S., Koga, J., Tanabe, … Electrochemical Society

1

2

3

4

5

6

7

8

9

10

11

12