IN-SITU RAPID ISOTHERMAL PROCESSING OF THIN EPITAXIAL DIELECTRIC FILMS ON SILICON AND COMPOUND SEMICONDUCTORS

IN-SITU RAPID ISOTHERMAL PROCESSING OF THIN EPITAXIAL DIELECTRIC FILMS ON SILICON AND COMPOUND SEMICONDUCTORS

Author(s):

Singh, R.

Publication title:

Photon, beam, and plasma stimulated chemical processes at surfaces : symposium held December 1-4, 1986, Boston, Massachusetts, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

75

Pub. Year:

1987

Page(from):

681

Page(to):

690

Pages:

10

Pub. info.:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9780931837418 [0931837413]

Language:

English

Call no.:

M23500/75

Type:

Conference Proceedings

Details

TDL ID:	ZA00015560
Series ID:	PA00000011
Conf. info. (Name):	Symposium on photon, beam, and plasma stimulated chemical processes at surfaces
Conf. info. (Number):	1986
Conf. info. (Venue):	Boston, MA, USA
Conf. info. (Date):	1986.12.01-1986.12.04

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