FLUORIDE ATOM PRODUCTION MECHANISMS FROM COF2 AND NF3 IN UV LASER ETCHING OF POLY-SILICON AND MOLYBDENUM
- Author(s):
- Publication title:
- Photon, beam, and plasma stimulated chemical processes at surfaces : symposium held December 1-4, 1986, Boston, Massachusetts, U.S.A.
- Title of ser.:
- Materials Research Society symposium proceedings
- Ser. no.:
- 75
- Pub. Year:
- 1987
- Page(from):
- 385
- Page(to):
- 394
- Pages:
- 10
- Pub. info.:
- Pittsburgh, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9780931837418 [0931837413]
- Language:
- English
- Call no.:
- M23500/75
- Type:
- Conference Proceedings
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