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STRAIN MEASUREMENT IN EPITAXIAL NiSi2/Si(111) BY MeV ION CHANNELING

Author(s):
Publication title:
Layered structures and epitaxy : symposium held December 2-4, 1985, Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
56
Pub. Year:
1985
Page(from):
157
Page(to):
162
Pages:
6
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9780931837210 [0931837219]
Language:
English
Call no.:
M23500/56
Type:
Conference Proceedings

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