STRAIN AND DAMAGE IN SILICON DUE TO A DEEP OXYGEN IMPLANTATION
- Author(s):
- Publication title:
- Semiconductor-on-insulator and thin film transistor technology : symposium held December 3-6, 1985, Boston, Massachusetts, U.S.A.
- Title of ser.:
- Materials Research Society symposium proceedings
- Ser. no.:
- 53
- Pub. Year:
- 1985
- Page(from):
- 263
- Page(to):
- 268
- Pages:
- 6
- Pub. info.:
- Pittsburgh, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9780931837180 [0931837189]
- Language:
- English
- Call no.:
- M23500/53
- Type:
- Conference Proceedings
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