DAMAGE REMOVAL PROCESSES IN ION IMPLANTED, RAPIDLY ANNEALED GaAs

DAMAGE REMOVAL PROCESSES IN ION IMPLANTED, RAPIDLY ANNEALED GaAs

Author(s):

Publication title:

Rapid thermal processing : symposium held December 2-4, 1985, Boston, Massachusetts, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

52

Pub. Year:

1985

Page(from):

361

Page(to):

368

Pages:

8

Pub. info.:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9780931837173 [0931837170]

Language:

English

Call no.:

M23500/52

Type:

Conference Proceedings

Details

TDL ID:	ZA00015538
Series ID:	PA00000011
Conf. info. (Name):	Symposium on rapid thermal processing
Conf. info. (Number):	1985
Conf. info. (Venue):	Boston, MA, USA
Conf. info. (Date):	1985.12.02-1985.12.04

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