RAPID THERMAL ANNEALING OF ION IMPLANTED p-n JUNCTIONS IN SILICON
- Author(s):
- Publication title:
- Rapid thermal processing : symposium held December 2-4, 1985, Boston, Massachusetts, U.S.A.
- Title of ser.:
- Materials Research Society symposium proceedings
- Ser. no.:
- 52
- Pub. Year:
- 1985
- Page(from):
- 225
- Page(to):
- 232
- Pages:
- 8
- Pub. info.:
- Pittsburgh, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9780931837173 [0931837170]
- Language:
- English
- Call no.:
- M23500/52
- Type:
- Conference Proceedings
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