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A SIMPLE MODEL FOR THE TRANSIENT, ENHANCED DIFFUSION OF ION-IMPLANTED PHOSPHOROUS IN SILICON

Author(s):
Publication title:
Energy beam-solid interactions and transient thermal processing/1984 : symposium held November 26-30, 1984, Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
35
Pub. Year:
1985
Page(from):
341
Page(to):
346
Pages:
6
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9780931837005 [0931837006]
Language:
English
Call no.:
M23500/35
Type:
Conference Proceedings

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