Nucleation phenomena in transitions from two to three phases, diffusion couples, phase stability, the thin film formation of some silicides
- Author(s):
- d'Heurle, F. M.
- Publication title:
- Thin films and interfaces II : symposium held November 1983, in Boston, Massachusetts, U.S.A.
- Title of ser.:
- Materials Research Society symposium proceedings
- Ser. no.:
- 25
- Pub. Year:
- 1984
- Page(from):
- 3
- Page(to):
- 8
- Pages:
- 6
- Pub. info.:
- New York: North-Holland
- ISSN:
- 02729172
- ISBN:
- 9780444009050 [0444009051]
- Language:
- English
- Call no.:
- M23500/25
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Diffusion Processes in Silicides: A Comparison between Bulk and Thin Film Phase Formation
MRS - Materials Research Society |
Materials Research Society |
MRS - Materials Research Society |
8
Conference Proceedings
70 Reactive Diffusion in the Ni-Si System: Influence of Ni Thickness on the Phase Formation Sequence
Electrochemical Society |
3
Conference Proceedings
Interface Reactions with Formation of a Solid Phase on a Solid Substrate:A Short Overview
Trans Tech Publications |
Materials Research Society |
MRS - Materials Research Society |
North-Holland |
5
Conference Proceedings
In Situ Monitoring of Thin Film Reactions During Rapid Thermal Annealing: Nickel Silicide Formation
Electrochemical Society |
MRS - Materials Research Society |
Trans Tech Publications |
12
Conference Proceedings
FORMATION OF BURIED TiSi2 LAYERS IN SINGLE CRYSTAL SILICON BY ION IMPLANTATION
Materials Research Society |