ARSENIC IMPLANT ACTIVATION AND REDISTRIBUTION IN P-TYPE SILICON INDUCED BY PULSED ELECTRON BEAM ANNEALING

ARSENIC IMPLANT ACTIVATION AND REDISTRIBUTION IN P-TYPE SILICON INDUCED BY PULSED ELECTRON BEAM ANNEALING

Author(s):

Publication title:

Laser-solid interactions and transient thermal processing of materials : symposium held November 1982 in Boston, Massachusetts, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

13

Pub. Year:

1983

Page(from):

419

Page(to):

424

Pages:

6

Pub. info.:

New York: North-Holland

ISSN:

02729172

ISBN:

9780444007889 [0444007881]

Language:

English

Call no.:

M23500/13

Type:

Conference Proceedings

Details

TDL ID:	ZA00015497
Series ID:	PA00000011
Conf. info. (Name):	Symposium on laser-solid interactions and transient thermal processing of materials
Conf. info. (Number):	1982
Conf. info. (Venue):	Boston, MA, USA
Conf. info. (Date):	1982.11.01-1982.11.04

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