Characterization of a Batch HF Vapor Processor for MEMS Release Etching
- Author(s):
- Publication title:
- Microfabricated systems and MEMS VII : proceedings of the international symposium
- Title of ser.:
- Electrochemical Society Proceedings Series
- Ser. no.:
- 2004-09
- Pub. Year:
- 2004
- Page(from):
- 127
- Page(to):
- 137
- Pages:
- 11
- Pub. info.:
- Pennington, N.J.: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566774222 [1566774225]
- Language:
- English
- Call no.:
- E23400/200409
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Evaluation of Undercut and Applicability of a Batch HF Vapor Etching System in MEMS Release Etch Processes
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |
SPIE-The International Society for Optical Engineering |
IMAPS |
9
Conference Proceedings
Etching of Silicon Oxide by HF/Solvent Mixtures Condensed from a Vapor Phase
American Institute of Chemical Engineers |
Electrochemical Society |
10
Conference Proceedings
Comparison between wet HF etching and vapor HF etching for sacrificial oxide removal
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
11
Conference Proceedings
Post Oxide Etching Cleaning Process Using Integrated Ashing and HF Vapor Process
Electrochemical Society |
6
Conference Proceedings
Dry release process of anhydrous HF gas-phase etching for the fabrication of a vibrating microgyroscope
SPIE - The International Society for Optical Engineering |
Electrochemical Society |