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FORMATION OF ULTRA-SHALLOW JUNCTIONS BY PLASMA DOPING

Author(s):
TSUTSUl, KAZUO 1
SASAKI, YUICHIRO 2
JlN, CHENG-GUO 2
TAMURA, HlDEKI 2
OKASHITA, KATSUM 2
ITO, HlROYUKI 2
MlZUNO, BUNJl 2
SAUDDIN, HENDRIANSYAH 2,3,
MAJIMA, KENTA 1
SATOH, TAKAHISA 3
FUKAGAWA, YOTARO 1
KAKUSHIMA, KUNIYUKl 1
IWAI, HlROSHI 3
8 more
Publication title:
Semiconductor technology (ISTC 2006) : proceedings of the 5th International Conference on Semiconductor Technology
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2006-03
Pub. Year:
2006
Page(from):
232
Page(to):
241
Pages:
10
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566774376 [1566774373]
Language:
English
Call no.:
E23400/200603
Type:
Conference Proceedings

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