Fabrication and characterization of n- and p-channel poly-Si TFTs by sputtering deposition of ultra thin gate SiO2 films

Fabrication and characterization of n- and p-channel poly-Si TFTs by sputtering deposition of ultra thin gate SiO2 films

Author(s):

Publication title:

Thin Film Transistor Technologies (TFTT VII) : proceedings of the international symposium

Title of ser.:

Electrochemical Society Proceedings Series

Ser. no.:

2004-15

Pub. Year:

2005

Page(from):

74

Page(to):

79

Pages:

6

Pub. info.:

Pennington, N.J.: Electrochemical Society

ISSN:

01616374

ISBN:

9781566774581 [1566774586]

Language:

English

Call no.:

E23400/200415

Type:

Conference Proceedings

Details

TDL ID:	ZA00015403
Series ID:	PA00000028
Conf. info. (Name):	Symposium on Thin Film Transistor Technologies : TFTT
Conf. info. (Number):	7th
Conf. info. (Venue):	Honolulu, HI, USA
Conf. info. (Date):	2004.10.04-2004.10.06

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